Extendible Process Using UV-Enhanced Gate Dielectric
Low-Temperature RTP for Source/Drain Engineering
Thermal Budget Reduction Drives RTP Beyond the 45 nm Node
RTP-Grown Oxynitride Layers Meet Gate Challenges
RTP Applications and Technology Options for the Sub-45 nm Nodes
UV-Enhanced Oxynitridation of Silicon Substrates
USJ Formation: Annealing Beyond 90 nm
Rapid Thermal Solid Phase Epitaxy Annealing for Ultra-Shallow Junction Formation
Physical Characterization of ZrO2 Films On Silicon After Rapid Thermal Anneal
In Situ Real-Time Studies of Nickel Silicide Phase Formation
