| MATTSON TECHNOLOGY TO INTRODUCE NEW EPITAXY REACTOR SYSTEM AT SEMICON WEST 1999
FREMONT, Calif. — July 6, 1999 — Mattson Technology
Inc. (NASDAQ: MTSN), a global supplier of advanced process
equipment used to manufacture semiconductors, today announced
it will introduce the EpiPro 5000 Epitaxial Silicon Deposition
System at SEMICON West 99. The EpiPro deposits a full range
of silicon film thicknesses on silicon wafers up to 200mm
in diameter for discrete, bipolar and MOS devices, which
are used in a variety of products ranging from computers
to electric cars. The new system combines the innovative
technology, productivity and reliability enhancements obtained
from a worldwide installed base of 400 epitaxial systems.
Mattson is a key exhibitor at SEMICON WEST 99, to be held
July 12-14, at San Francisco's Moscone Center, South Hall,
Booth #218. The company has received multiple system orders
for the system and will begin shipping in Q3 1999.
"The EpiPro 5000 is a good example of Mattson’s
core vision of continually advancing technology and improving
productivity. We feel this system has better uniformity than
any other batch epi system in the world. At the same time,
it provides a big increase in throughput, thereby reducing
the cost of ownership," said Brad Mattson, CEO of Mattson
Technology. "We believe this combination will be a huge
draw in this market segment." Mattson Technology acquired
Concept Systems Design on August 5, 1998. Concept manufactured
a line of epitaxy equipment that included the venerable Gemini
line of epitaxial reactors.
A combination of features provides the EpiPro reactors with
significantly improved film quality and in cost of ownership
through high wafer throughput. The dual chambered EpiPro
5000 is the only epitaxial reactor that has the flexibility
to process a broad range of epitaxial silicon thicknesses,
from 1 to more than 100 microns, with tight process control
for all film thicknesses. The chamber’s patented, bell-jar
design provides uniform delivery of reactant gases over a
large area. An ex situ fiberoptic sensor measures temperature
on the back side of the susceptor, so that temperature repeatability
is not affected by the deposition process. To further improve
temperature uniformity and to minimize slip, RF coupling
to the susceptor has been dramatically enhanced by lowering
the RF frequency to 25 kHz. The dual chambered EpiPro processes
up to 36 150mm wafers, the largest epitaxial batch size available
today, for a 50 percent improvement over competitive equipment.
The systems can be installed side by side, allowing for an
additional 30 percent throughput per floorspace savings.
These features, plus 95 percent or greater uptime, combine
to give the EpiPro 5000 the lowest cost of ownership for
this equipment class.
About Mattson Technology
Mattson Technology Inc., is a leading supplier of thermal,
plasma and wet semiconductor processing equipment. The company's
products combine advanced process technology on a high productivity
platform, backed by industry-leading support. Since beginning
operations in 1989, the company's core vision has been to
help bring technology leadership and productivity gains to
semiconductor manufacturers worldwide. Headquartered in Fremont,
Calif., the company maintains sales and support centers throughout
the United States, Europe, Asia/Pacific and Japan. For more
information, please contact Mattson Technology Inc., 2800
Bayview Drive, Fremont, Calif. 94538. Telephone: (800) MATTSON.
Fax: (510) 657-0165. Internet:www.mattson.com
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