MATTSON TECHNOLOGY TEAMS WITH CFM TECHNOLOGIES TO PROVIDE ADVANCED WET/DRY CLEANING SOLUTIONS FOR SEMICONDUCTOR PROCESSING

FREMONT, Calif. — June 24, 1999 — Mattson Technology (NASDAQ: MTSN) and CFM Technologies (NASDAQ:CFMT) today announced that they are working together to further develop and market total cleaning solutions for selected semiconductor processing applications using dry and wet wafer cleaning systems.

Brad Mattson, Mattson Technology’s CEO, said, "We are focusing on total cleaning solutions as a major growth opportunity for Mattson’s Aspen Strip products. As the industry moves ahead with linewidth shrinks and later into 300mm manufacturing, it will be more important than ever to provide strip technology that achieves the clean, contamination free results required in this arena."

Mattson and CFM will initially focus on optimizing wafer cleaning for post implant resist removal with dry and wet cleaning. Resist implanted at high dose levels is very difficult to clean. All customers use a combination of dry plasma cleaning and wet chemical cleaning. Mattson and CFM are seeking to optimize equipment throughput and chemical usage, while achieving the cleanest possible wafers.

Roger Carolin, CEO of CFM Technologies, said, "We are extremely pleased to be working closely with Mattson Technology on total clean solutions. With the rising cost of equipping a fab, it’s good to be working on a solution that can meet advanced technology requirements and still take care of cost issues – a growing concern among all semiconductor makers."

Results stemming from the joint work will be presented at a cleaning symposium to be held on Thursday July 15, 1999 at the Mark Hopkins Inter-Continental Hotel in San Francisco. The event, cosponsored by CFM Technologies, will also feature invited speakers from leading edge semiconductor companies, Infineon Technologies, IBM, IMEC, AMD and STMicroelectronics. Symposium topics on advanced wafer cleaning will cover a variety of leading edge applications, ranging from post ash clean, cleaning vias with exposed low k dielectrics (FOX), cleaning next-generation low k materials, removing post-metal and pad etch residue, eliminating solvent for post metal etch residue removal, to optimized cleaning for high dose implant strip. Other projects will include publishing joint papers and additional experimental work that focuses on total clean solutions using dry/wet systems.

About Mattson Technology

Mattson Technology Inc., is a leading supplier of thermal, plasma and wet semiconductor processing equipment. The company's products combine advanced process technology on a high productivity platform, backed by industry-leading support. Since beginning operations in 1989, the company's core vision has been to help bring technology leadership and productivity gains to semiconductor manufacturers worldwide. Headquartered in Fremont, Calif., the company maintains sales and support centers throughout the United States, Europe, Asia/Pacific and Japan. For more information, please contact Mattson Technology Inc., 2800 Bayview Drive, Fremont, Calif. 94538. Telephone: (800) MATTSON. Fax: (510) 657-0165. Internet:www.mattson.com