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Press Releases - 2002

MATTSON TECHNOLOGY, INC. ANNOUNCES $45.6 MILLION PRIVATE PLACEMENT OF COMMON STOCK MATTSON TECHNOLOGY STRENGTHENS POSITION IN CHINA WITH STRIP ORDER FROM SEMICONDUCTOR MANUFACTURING INTERNATIONAL CORP


FREMONT, CA. March 27, 2002 - Mattson Technology, Inc. (Nasdaq: MTSN), a leading supplier of semiconductor wafer processing equipment used in "front-end" fabrication of integrated circuits, announced today that it has received an order for its Aspen II ICP Strip system from Shanghai-based silicon foundry company Semiconductor Manufacturing International Corp. (SMIC). The order is scheduled to begin shipment by the end of March and will be installed in SMIC's Fab 1, located in the Pudong New Area Hi-Tech Industrial Park. The Aspen II Strip system will be used for plasma resist strip applications.

SMIC President and CEO Dr. Richard Chang said, "We chose Mattson's Aspen II ICP Strip system over competitive systems because of its excellent productivity, high reliability and flexibility and low cost of ownership in running multiple process applications that are critical to the foundry business environment. The Aspen Strip's proven production track record and Mattson's global support were critical factors in our decision."

Julian Chu, country manager for Mattson Technology's China Operation, said, "We already have several AWP wet processing systems installed at SMIC, and we are pleased to strengthen our relationship with such a notable foundry with this strip order. Mattson currently has an installed base of more than 800 strip systems worldwide, and the SMIC order not only reinforces Mattson's leadership position in the strip arena, but it also underscores the growing acceptance of our leading-edge tools in the burgeoning China market."

About the Aspen II Strip
The Aspen II Strip system features Mattson's proprietary inductively coupled plasma (ICP) source for advanced sub-micron applications that require ultra-low contamination levels. The Aspen II Strip system offers the most advanced technology on a high productivity platform. The system combines zero damage and low contamination drive-in with high throughput and effectively strips resist and residue without the need for post-strip chemical processing. The Aspen II Strip provides chipmakers the process performance they require for advanced device manufacturing at the low cost of ownership they need to compete in today's market.

About Mattson Technology, Inc.

Mattson Technology, Inc. is a leading supplier of semiconductor wafer processing equipment used in "front-end" fabrication of integrated circuits. The company is a market leader in dry strip and RTP equipment, and its products combine advanced process technology on high-productivity platforms backed by industry-leading support. Since beginning operations in 1989, the company’s core vision has been to help bring technology leadership and productivity gains to semiconductor manufacturers worldwide. Headquartered in Fremont, Calif., the company maintains sales and support centers throughout the United States, Europe and Asia. For more information, please contact Mattson Technology, Inc., 47131 Bayside Parkway, Fremont, Calif. 94538. Telephone: (800) MATTSON/(510) 657-5900. Fax: (510) 492-5911. Internet: www.mattson.com.


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