| TRIQUINT SEMICONDUCTOR
ORDERS ADDITIONAL MATTSON CVD SYSTEMS
Mattson CVD Systems Help Expand Production of Semiconductors
for Communications Industry
FREMONT, Calif. — April 6, 2000 —Mattson Technology,
Inc. (NASDAQ: MTSN), a leading supplier of advanced process
equipment used to manufacture semiconductors, today announced
it has received a multimillion-dollar follow-on order for
multiple Aspen II plasma-enhanced chemical vapor deposition
(PECVD) systems from TriQuint Semiconductor, Inc. Installation
of the Aspen CVD systems is expected to begin in April.
TriQuint, a leading provider of advanced gallium arsenide
(GaAs) semiconductor devices used extensively in the communications
industries, will install the systems at its newly expanded
facility in Hillsboro, Oregon.
"The tremendous growth of worldwide communications
applications has fueled demand for GaAs devices," said
Brad Mattson, Mattson Technology's CEO. "As a result,
chipmakers need solutions that provide both production proven
technology and high productivity. We look forward to helping
TriQuint meet both its manufacturing and business objectives."
About Aspen II CVD
The Aspen II CVD system deposits silane-based films such
as oxide, oxynitride and nitride, as well as TEOS-based oxide
films. Mattson offers a full suite of PECVD applications:
ARC layers for excellent CD control; etch stop layers for
use with low k materials; passivation layers; IMD underlayers,
low temperature capping layers; and low k FSG layers. The
system can be configured with one or two multi-station process
chambers. Each chamber can process four wafers at a time,
providing extremely high throughput without sacrificing process
performance.
Mattson's plasma enhanced chemical vapor deposition (PECVD)
technology allows the system to process wafers at the relatively
low temperature of 400 degrees Celsius or less, required
for processing after aluminum metallization layers are deposited.
Film stress and density can be controlled independent of
process chemistry by the use of a low frequency radio frequency
bias.
About Mattson Technology
Mattson Technology Inc., is a leading supplier of thermal,
plasma and wet semiconductor processing equipment. The company's
products combine advanced process technology on a high productivity
platform, backed by industry-leading support. Since beginning
operations in 1989, the company's core vision has been to
help bring technology leadership and productivity gains to
semiconductor manufacturers worldwide. Headquartered in Fremont,
Calif., the company maintains sales and support centers throughout
the United States, Europe, Asia/Pacific and Japan. For more
information, please contact Mattson Technology Inc., 2800
Bayview Drive, Fremont, Calif. 94538. Telephone: (800) MATTSON.
Fax: (510) 657-0165. Internet:www.mattson.com
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